Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition > International Journal | 한양대 나노소재 및 시스템 연구실(nmsl)

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Electrochemical Nano-Materials and System Lab

International Journal

Electrochimica Acta 2024

Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition

Harold Philipsen; Youjung Kim; Bongyoung Yoo

관리자 · 조회 901 · 2025-02-03

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다음글 Silicon dioxide (SiO2) solid blocking layer on through-glass via surface for efficient highly selective copper filling